Spatially averaged film thickness models have been the preferred approach for simulation of falling film reactors. This paper will discuss both the general and specific limitations of available models. An improved model is proposed, which has been found to perform well in industrially relevant conditions. For its specific application to sulphonation/sulphation reactions yielding anionic surfactants, the improved model provides enhanced predictions about reactor performance, including relative colour intensity at different operational conditions.
CITATION STYLE
Talens-Alesson, F. I. (1999). The modelling of falling film chemical reactors. Chemical Engineering Science, 54(12), 1871–1881. https://doi.org/10.1016/S0009-2509(98)00497-7
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