We demonstrated that the 2.5nm-thick HfAIOx N-type NCFET based on defect-passivated multidomain switching can achieve a minimum 9 mV/dec subthreshold swing (SS), a negligible hysteresis of 1mV, an ultralow Ioff of 135fA/μm, a large Ion/I0ff ratio of 8.7×107 and a sub-60 mV/dec SS over 5 decade. For P-type NCFET, the non-hysteretic steep-slope switch is still reached under the synergistic effect of gate stress, defect passivation and doping engineering. The Al doping and defect passivation play the key role for reducing trap-related leakage, enhancing NC, and stabilizing multidomain switching. The highly scaled HfAIOx CMOS NCFET shows the potential for low power logic applications.
CITATION STYLE
Liu, C., Chen, H. H., Hsu, C. C., Fan, C. C., Hsu, H. H., & Cheng, C. H. (2019). Negative Capacitance CMOS Field-Effect Transistors with Non-Hysteretic Steep Sub-60mV/dec Swing and Defect-Passivated Multidomain Switching. In Digest of Technical Papers - Symposium on VLSI Technology (Vol. 2019-June, pp. T224–T225). Institute of Electrical and Electronics Engineers Inc. https://doi.org/10.23919/VLSIT.2019.8776482
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