Parameters of oxidative stress, DNA damage and DNA repair in type 1 and type 2 diabetes mellitus

Abstract

Objectives: (i) to determine the extent of oxidative stress and DNA damage and repair using a panel of selected markers in patients with type 1 and type 2 diabetes mellitus (T1DM, T2DM), (ii) to find their possible relationships with diabetes compensation and duration, and finally (iii) to test for the effect of functional polymorphisms in the 8-oxoguanin DNA glycosylase (rs1052133), catalase (rs1001179) and superoxide dismutase (rs4880) genes on respective intermediate phenotypes. Methods: A total of 207 subjects (23 children and 44 adults with T1DM, 52 adult patients with T2DM and 88 healthy adult control subjects) were enrolled in the study. The following markers of redox state were determined in participants: erythrocyte superoxide dismutase (Ery-SOD), whole blood glutathione peroxidase (WB-GPx), erythrocyte glutathione (Ery-GSH), plasma total antioxidant capacity (P-tAOC) and plasma malondialdehyde (P-MDA). Furthermore, the extent of DNA damage and repair was ascertained using the following parameters: DNA single strand breaks (DNAssb), DNA repair capacity (DNArc) and DNA repair index (DNRI). Results: Comparison of T1DM vs. T2DM patients revealed significantly higher Ery-GSH content (P<0.0001) and significantly lower Ery-SOD activity (P=0.0006) and P-tAOC level (P<0.0001) in T1DM subjects. T2DM diabetics exhibited a significant increase in DNAssb (P<0.0001) and significant decrease in both DNArc (P<0.0001) and DNRI (P<0.0001) compared with T1DM patients. Patient's age (irrespective of DM type) significantly correlated with DNAssb (r=0.48, P<0.0001), DNArc (r=-0.67, P<0.0001) and DNRI (r=-0.7, P<0.0001). Allele frequencies of all studied polymorphisms did not exhibit any significant association with the investigated parameters. Conclusion: We demonstrated significant age-and DM type-related changes of oxidative DNA modification and capacity for its repair in subjects with T1DM and T2DM. © 2011 Informa UK, Ltd.