The field emission properties of graphene aggregates films deposited on Fe-Cr-Ni alloy substrates

Abstract

The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of H 2 and CH 4 with flow rates of 100sccm and 12sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy (SEM), and transparent electron microscopy (TEM). The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0V/ m. The current density of 2.1mA/ cm 2 at electric field of 2.4V/ m was obtained. Copyright © 2010 Zhanling Lu et al.