Comparative Evaluation of Distribution of Stresses in Osseointegrated Crestal and Basal Implant in Zygomatic Region of Maxilla

Abstract

Aim The aim of this study was to evaluate the distribution of stresses in osseointegrated crestal and basal implant in zygomatic region of maxilla and to identify the preferable implant option for better stress distribution.Material and Method The present in vitro study was performed to evaluate stress patterns in bone around basal and crestal dental implant under axial and oblique loading in maxillary zygomatic region with the help of a finite element analysis (FEA). To conduct this study, the following materials were used: computer software ANSYS, basal implants with dimensions 3.7 × 10 mm, and crestal implants with dimensions 3.7 x 10 mm. The amount of load transferred on the bone adjacent to the implant in an axial and transverse load of 100 N at 0 and 45 degrees, respectively, was placed on both types of implants. A three-dimensional (3D) scanner was use to generate 3D simulated model of basal and crestal implants. FEA modelling was generated that replicated the zygomatico maxillary region with special emphasis on bone architecture, bone density, angulation, width, and length of implant prototype. Further, material properties were defined for cortical bone, dense trabecular bone, low density trabecular bone, and titanium on the basis of Young’s modulus of elasticity.Results These values were used by FEA software (ANSYS) to generate a 3D mesh model of bone and implant. Finally, Von Mises (equivalent stress) (MPa) values on the implant were computed using FEA software. The values of maximum Von Mises equivalent stress on the implant collars, body, apex, and bony interface were obtained.Conclusion Maximum stresses were seen at the cortical bone with basal implant placed inside the bone. Stresses that are transferred more to the bone through implant promote bone remineralization. Maximum Von Mises stresses were observed on basal implant body. Thus, these greater stresses have the capacity to simulate mineralization in the cortical bone; this makes basal implant a suitable option for placement inside the cortical bone.