Dielectric Permittivity and Intercalation Parameters of Li Ion Intercalated Atomic Layer Deposited ZrO[sub 2]

Abstract

An exploratory study of Li-ion intercalation in atomic layer deposited (ALD) ZrO2 has been made. Intercalation parameters have been obtained and the dielectric permittivity as a function of frequency at different intercalation levels has been studied. The ALD-ZrO2 thin films were polycrystalline with a stable monoclinic polymorph and also nearly stoichiometric. The dielectric response of Li ion intercalated ALD-ZrO 2 reveals complex relaxation processes. The dielectric constant ε∞, shows a strong dependence on the intercalated ion concentration. The explicit variation in dielectric loss, ε″, also suggests different relaxation processes being important at different levels of intercalation. The intercalation probably involves defects in ZrO2 that give rise to different dipole moments and localized states at different ion concentrations in addition to the expected Li ion-electron pairs. © 2004 The Electrochemical Society. All rights reserved.