A new design for secondary electron measurement and application

Abstract

The secondary electron is researched in many fields. In order to measure the secondary electron angular distribution of all the solid angle, the X axis support and Y axis support are proposed. The energy distribution of the secondary electron also can be measured. The accumulated charge on the insulated material surface during the secondary electron measurement has very bad effects. Although many methods have been used for the charge neutralization, many defects are still not resolved. So the plasma neutralization is proposed. The plasma neutralization can also be used in the electron microscopy.