Structural studies of NiTe2 thin films with the influence of amino additives

Abstract

Background: Nickel, one of the transition metals synthesised with chalcogenides such as Se, S and Te with possible combinations of nickel chalcogenides such as NiS2, NiSe, NiSe2 and Ni3Se2. The combination of nickel and telluride are the fewest being observed due to the nature of tellurium that is relatively heavier than both sulphur and selenium, thus poorly-adhesive onto the substrate. Methods: Therefore, NiTe2 thin film is being synthesised onto the indium tin oxide (ITO) coated glass substrates with the complex additives (Triethanolamine, TEA and ethylenediaminetetraacetic acid, EDTA) and their properties are studied. The present work is focusing on the NiTe2 synthesise through electrochemical route. Results: Cyclic voltammetry experiments have been done prior to electrodeposition in order to get the electrodeposition potential range. The observable reduction range is between -0.9-(-1.1) V with 5-10 min induction period of full thin film distribution depending upon the electrolyte conditions. Conclusion: The electrodeposition is carried out using the potentials in the reduction region, producing the well-adherent, well-distributed and dark-coloured thin films. Structural studies confirm the presence of NiTe2 in electrolyte containing TEA with crystallite sizes lying on the 9-20 nm range.