Aluminum Nitride (AlN) is a promising piezoelectric material for microelectromechanical systems owing to its attractive physical and chemical properties and CMOS compatibility. It has a moderate piezo response compared to its rival material bound to its wide application. This obstacle can be overcome by doping or alloying. Sc alloying increases the piezo response of AlN up to four-fold; it also increases the electromechanical coupling coefficient, which is a prominent figure of merit for any MEMS device application. Sc doping induces elastic softening in wurtzite AlN, enhances polarization, and increases piezoelectric constants. However, the possibility of phase separation at higher Sc concentrations, and the wurtzite phase of AlN, which is responsible for piezoelectricity, becomes negligible. Therefore, knowing the optimum concentration of Sc for device applications is necessary. In this work, using density functional theory, we calculated the lattice parameter, band and density of states along with the physical properties such as Young’s modulus, the bulk modulus, Poisson’s ratio, and elastic constants of pristine AlN and Sc doped AlN. The DFT calculations show that the geometrical optimized lattice parameters agree with the literature. As a function of increased Sc concentration, the calculated Young’s modulus and elastic constants decrease, indicating a decrease in hardness and elastic softening, respectively. Meanwhile, the bulk modulus and Poisson’s ratio increase with an increase in Sc concentration, representing an increase in the crystal cell parameters and elastic deformation. AlN and AlScN thin films were grown on Si (111) substrate using magnetron sputtering to study the structural properties experimentally. The deposited films show the required c-axis (002) preferential crystallographic orientation. The XRD peaks of Sc doped AlN thin films have shifted to a lower angle than pristine AlN, indicating elastic softening/tensile stress in grown thin films. So, from our observation, we can conclude that Sc doping induces elastic softening in AlN and deposited films have a preferential crystallographic orientation that can be applied in MEMS devices.
CITATION STYLE
Rudresh, J., Srihari, N. V., Kowshik, S., Sandeep, & Nagaraja, K. K. (2023). Investigation of Elastic Properties of Sc Doped AlN: A First principles and Experimental Approach †. Engineering Proceedings, 59(1). https://doi.org/10.3390/engproc2023059086
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