Influence of nitrogen partial pressure and substrate bias on the mechanical properties of VN coatings

8Citations
Citations of this article
16Readers
Mendeley users who have this article in their library.

Abstract

Vanadium nitride coatings were deposited via magnetron reactive sputtering system with varying nitrogen partial pressures and negative substrate bias to further understand the influence of the sputtering conditions on the microstructure and the mechanical performance. Grazing incidence X-ray diffraction, field emission scanning electron microscopy equipped with energy dispersive X-ray and X-ray photoelectron spectroscopy were used to characterize the microstructure; nano-hardness tester and profilometer were used to measure the mechanical performance. By varying the nitrogen partial pressures from 0.007 Pa to 0.29 Pa, more compact coating with higher hardness (22.9 GPa) was achieved at 0.29 Pa. In parallel, the influence of bias voltage on the residual stress and hardness was significant. © 2012 Published by Elsevier Ltd.

Cite

CITATION STYLE

APA

Qiu, Y., Zhang, S., Li, B., Lee, J. W., & Zhao, D. (2012). Influence of nitrogen partial pressure and substrate bias on the mechanical properties of VN coatings. In Procedia Engineering (Vol. 36, pp. 217–225). Elsevier Ltd. https://doi.org/10.1016/j.proeng.2012.03.034

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free