Abstract
Thin Ag films deposited onto SiO2/Si substrates by DC magnetron sputtering and thereafter annealed at temperatures 100-500°C are investigated by scanning tunneling and atomic force microscopy. It is shown that the film surface topography and microstructure are considerably changed as a result of annealing. To provide a quantitative estimation of the surface topography changes of Ag films the surface fractal dimension was calculated. Elasticity and hardness of the films are studied by a nanoindentation technique. The films are found to have value of elastic modulus close to that of bulk silver while their hardness and yield stress are essentially higher.
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Shugurov, A., Panin, A., Chun, H. G., & Oskomov, K. (2003). Surface morphology, microstructure and mechanical properties of thin Ag films. In Proceedings - KORUS 2003: 7th Korea-Russia International Symposium on Science and Technology (Vol. 1, pp. 21–29). Institute of Electrical and Electronics Engineers Inc. https://doi.org/10.4150/kpmi.2003.10.3.190
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