Novel fluorinated polymers for releasing material in nanoimprint lithography

Abstract

In recent years, utilization and reduction of pattern size are following nanoimprint lithography (NIL) quickly. Since nanoimprint is mainly contact printing, a higher separation force causes damages in the master mold and imprinting tool, and degradation in pattern quality as well. There is a mold-release characteristic of a master mold and mold materials as one of the biggest subjects in utilization. Then, we focused on release materials, and the new fluorinated polymers, based on α-chloroacrylate added to mold materials, were developed. In this paper, we report these synthesis methods, specific properties such as static contact angle as well as the segregation of fluorinated polymers on resin surfaces. © 2012CPST.