Nb-doped Ti2O3 films deposited through grid-assisted magnetron sputtering on glass substrate: Electrical and optical analysis

Abstract

Niobium doped dititanium trioxide (Ti2O3:Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti2O3:Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of Ti2O3. No niobium oxide NbxOy peaks were observed, which indicates that niobium oxide if formed, is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It was observed that "as-deposited" Ti2O3:Nb films (without post annealing) are transparent and electrical conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable thickness of the film and a miminum resistivity of 2x10-2 O.cm which indicates that there is potential for application as Transparent Conductive Oxide (TCO).