Abstract
The reduction of resistance and surface roughness obtained by CO2cluster jet were up to 81% and 42.3% compared with pristine graphene. The shifts in Raman spectra also implied chemical doping and "mono-layerization". Thus, CO2cluster jet has the potential for planarization, cleaning and flattening of the graphene. This journal is
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CITATION STYLE
APA
Choi, H., Kim, J. A., Cho, Y., Hwang, T., Lee, J., & Kim, T. (2014). Conditioning of graphene surface by CO2cluster jet. RSC Advances, 4(79), 41922–41926. https://doi.org/10.1039/c4ra05079g
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