Second-harmonic generation from realistic film-substrate interfaces: The effects of strain

37Citations
Citations of this article
28Readers
Mendeley users who have this article in their library.
Get full text

Abstract

The optical second-harmonic generation from a thin crystalline film on a substrate is theoretically investigated for both s and p polarized incident light. The contributions of lattice misfit strain as well as of misfit dislocation strain to the second-order nonlinear optical susceptibility are described using a nonlinear photoelastic tensor and can be separated by a polarization analysis of the scattered light at the second harmonic frequency. For the s(ω)→s(2ω) and p(ω)→s(2ω) scattering geometries, the nonlinear optical signal will be determined by dislocation strain only, whereas for the s(ω)→p(2ω) and p(ω)→p(2ω) geometries both lattice misfit strain and misfit dislocation strain will contribute. © 2000 American Institute of Physics.

Cite

CITATION STYLE

APA

Lyubchanskii, I. L., Dadoenkova, N. N., Lyubchanskii, M. I., Rasing, T., Jeong, J. W., & Shin, S. C. (2000). Second-harmonic generation from realistic film-substrate interfaces: The effects of strain. Applied Physics Letters, 76(14), 1848–1850. https://doi.org/10.1063/1.126188

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free