The chemical solution deposition (CSD) method involves the synthesis of films with a mixture of precursor molecules, dissolved in a common solvent, and uniformly spread on a substrate. When applied to single crystal substrates, sequential events occur during heating that can produce a single crystal, epitaxial film. Upon heating, precursor film decomposes (pyrolysis) to form an inorganic, amorphous phase that crystallizes at a higher temperature, forming a single crystal film at higher temperatures. The fundamentals of CSD will be reviewed to include the relation between cracking and film thickness-one limitation of CSD, why a polycrystalline film with nano grain size is formed before being converted into a single crystal, the crystallization of metastable phases, mechanisms that convert the polycrystalline film into a single crystal film, how polycrystalline films can break into isolated islands with a specific crystallographic orientation that can be used to 'seed' a single crystalline film, and why dissimilar crystal structures epitaxially grow on one another.
CITATION STYLE
Lange, F. (2013). Epitaxial films. In Chemical Solution Deposition of Functional Oxide Thin Films (Vol. 9783211993118, pp. 383–405). Springer-Verlag Wien. https://doi.org/10.1007/978-3-211-99311-8_16
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