Epitaxial films

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Abstract

The chemical solution deposition (CSD) method involves the synthesis of films with a mixture of precursor molecules, dissolved in a common solvent, and uniformly spread on a substrate. When applied to single crystal substrates, sequential events occur during heating that can produce a single crystal, epitaxial film. Upon heating, precursor film decomposes (pyrolysis) to form an inorganic, amorphous phase that crystallizes at a higher temperature, forming a single crystal film at higher temperatures. The fundamentals of CSD will be reviewed to include the relation between cracking and film thickness-one limitation of CSD, why a polycrystalline film with nano grain size is formed before being converted into a single crystal, the crystallization of metastable phases, mechanisms that convert the polycrystalline film into a single crystal film, how polycrystalline films can break into isolated islands with a specific crystallographic orientation that can be used to 'seed' a single crystalline film, and why dissimilar crystal structures epitaxially grow on one another.

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APA

Lange, F. (2013). Epitaxial films. In Chemical Solution Deposition of Functional Oxide Thin Films (Vol. 9783211993118, pp. 383–405). Springer-Verlag Wien. https://doi.org/10.1007/978-3-211-99311-8_16

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