Kinetics of the oxidation of Zn foils in air atmosphere

Abstract

The formation kinetics of ZnO thin films grown by oxidation of polycrystalline Zn foils in air atmosphere at temperatures below the melting point is reported. Previous to the oxidation process the Zn foils were polished to produce mirror-like finished surfaces. The growth rate of the ZnO films was monitored by ellipsometric measurements. The growth rate of the ZnO films under 100 nm follows a linear and parabolic behavior in accordance with previously reported studies. The thicknesses of the films strongly influence the appearance of the final produced ZnO surface. The ZnO films surfaces with thicknesses less than 100 nm resulted uniform with low rms roughness. However as the films become thicker the rms roughness increased and a uniform distribution of whiskers was observed. X-ray diffraction and photoluminescence (PL) studies were done on the ZnO films to find out their structural and optical characteristics. PL spectra on the films are composed by two main bands; a weak near-band gap in the ultraviolet region and a strong but well defined green band. A discussion is included on the origins of the observed PL spectra.