Single-crystalline epitaxial platinum film on yttrium-stabilized zirconia (111) prepared by sputtering deposition

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Abstract

Sputtering is an important film deposition method that has been used for the fabrication of thin films used in basic research to the mass production process in factories. However, single-crystalline epitaxial platinum film has not been successfully prepared on yttria-stabilized zirconia (YSZ) (111) substrates by the sputtering method. We have deposited platinum by inductively coupled plasma-assisted sputtering on YSZ(111) with postdeposition annealing at 750-850 °C. As a result, single-crystalline epitaxial films with a root mean square roughness better than 0.2 nm were successfully fabricated.

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Tanaka, H., & Taniguchi, M. (2016). Single-crystalline epitaxial platinum film on yttrium-stabilized zirconia (111) prepared by sputtering deposition. In Japanese Journal of Applied Physics (Vol. 55). Japan Society of Applied Physics. https://doi.org/10.7567/JJAP.55.120304

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