Sputtering is an important film deposition method that has been used for the fabrication of thin films used in basic research to the mass production process in factories. However, single-crystalline epitaxial platinum film has not been successfully prepared on yttria-stabilized zirconia (YSZ) (111) substrates by the sputtering method. We have deposited platinum by inductively coupled plasma-assisted sputtering on YSZ(111) with postdeposition annealing at 750-850 °C. As a result, single-crystalline epitaxial films with a root mean square roughness better than 0.2 nm were successfully fabricated.
Tanaka, H., & Taniguchi, M. (2016). Single-crystalline epitaxial platinum film on yttrium-stabilized zirconia (111) prepared by sputtering deposition. In Japanese Journal of Applied Physics (Vol. 55). Japan Society of Applied Physics. https://doi.org/10.7567/JJAP.55.120304