Room-temperature lasing at 1.82 μm of GaInSbAlGaSb quantum wells grown on GaAs substrates using an interfacial misfit array

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Abstract

The authors report the device characteristics of GaInSbAlGaSb quantum well (QW) lasers monolithically grown on GaAs substrates. The 7.8% lattice mismatch between GaAs substrates and GaSb buffer layers can be completely accommodated by using an interfacial misfit (IMF) array. Room-temperature lasing operation is obtained from a 1.25-mm -long device containing six-layer Ga0.9 In0.1 Sb Al0.35 Ga0.65 Sb QWs at 1.816 μm with a threshold current density of 1.265 kA cm2. The observed characteristic temperature and temperature coefficient are 110 K and 9.7 ÅK, respectively. This IMF technique will enable a wide range of lasing wavelengths from near-infrared to midwavelength-infrared regimes on a GaAs platform. © 2007 American Institute of Physics.

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Tatebayashi, J., Jallipalli, A., Kutty, M. N., Huang, S. H., Balakrishnan, G., Dawson, L. R., & Huffaker, D. L. (2007). Room-temperature lasing at 1.82 μm of GaInSbAlGaSb quantum wells grown on GaAs substrates using an interfacial misfit array. Applied Physics Letters, 91(14). https://doi.org/10.1063/1.2793186

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