Interdependence of optimum exposure dose regimes and the kinetics of resist dissolution for electron beam nanolithography of polymethylmethacrylate

Abstract

The authors report a systematic experimental study of dense nanostructures in polymethylmethacrylate (PMMA) created by low-energy electron beam lithography (EBL) with varying duration and temperature of the resist dissolution. They observe that decreasing the development temperature not only yields the widest favorable exposure dose regimes but also requires highest exposure doses to fabricate dense nanopatterns. They interpret the observed interdependence of the exposure doses and the development temperatures in terms of a simple kinetic model describing the diffusion mobility of fragments in exposed PMMA during dissolution and discuss the corresponding molecular mechanisms that determine the resolution and sensitivity of EBL nanofabrication.