Low temperature growth of carbon nanomaterials on the polymer substrate using ion assisted microwave plasma CVD

Abstract

In this study, the successful growth of carbon nanotubes and few-layered graphene sheets on the silicon and polyimide substrates at relatively low temperature of 230~260°C by microwave surface wave plasma CVD technique lias been demonstrated. Graphite-encapsulated Ni nanoparticles have been used as the catalyst for growing carbon nanomaterials (CNMs) in NH 3/CH 4 plasma. The results of high-resolution transmission electron microscope(TEM) analysis show the effect of substrate on the structure of CNMs. © 2012CPST.