Abstract
Fracture experiments to evaluate the cleavage energy of the (110)[1 1̄ 0] and (111)[1 1 2̄] cleavage systems in silicon at room temperature and humidity give 2.7±0.3 and 2.2±0.2 J/m2, respectively, lower than any previous measurement and inconsistent with density functional theory (DFT) surface energy calculations of 3.46 and 2.88 J/m2. However, in an inert gas environment, we measure values of 3.5±0.2 and 2.9±0.2 J/m2, consistent with DFT, that suggest a previously undetected stress corrosion cracking scenario for Si crack initiation in room conditions. This is fully confirmed by hybrid quantum-mechanics-molecular-mechanics calculations. © 2014 American Physical Society.
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CITATION STYLE
Gleizer, A., Peralta, G., Kermode, J. R., De Vita, A., & Sherman, D. (2014). Dissociative chemisorption of O2 inducing stress corrosion cracking in silicon crystals. Physical Review Letters, 112(11). https://doi.org/10.1103/PhysRevLett.112.115501
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