Abstract
A sample of the β-Ga2O3/wurtzite GaN heterostructure has been grown by dry thermal oxidation of GaN on a sapphire substrate. X-ray diffraction measurements show that the β-Ga2O3 layer was formed epitaxially on GaN. The valence band offset of the β-Ga2O3/wurtzite GaN heterostructure is measured by X-ray photoelectron spectroscopy. It is demonstrated that the valence band of the β-Ga2O3/GaN structure is 1.40 ± 0.08 eV. © 2012 Wei et al.
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Wei, W., Qin, Z., Fan, S., Li, Z., Shi, K., Zhu, Q., & Zhang, G. (2012). Valence band offset of β-Ga2O3/wurtzite GaN heterostructure measured by X-ray photoelectron spectroscopy. Nanoscale Research Letters, 7. https://doi.org/10.1186/1556-276X-7-562
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