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Journal ArticleOPEN ACCESS

Control of sputtering parameters for deposition of NbN thick films

  • Jha R
  • Awana V
Novel Superconducting Materials (2013) 1(1)
DOI: 10.2478/nsm-2013-0002
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Abstract

We report a detailed study on control of sputtering parameters for synthesizing NbN superconducting thick films. The NbN films are deposited on single crystalline silicon (100) by DC reactive sputtering, i.e., deposition of Nb in the presence of reactive N

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APA

Jha, R., & Awana, V. P. S. (2013). Control of sputtering parameters for deposition of NbN thick films. Novel Superconducting Materials, 1(1). https://doi.org/10.2478/nsm-2013-0002

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