Submicron silicon strip waveguides have recently attracted a lot of attention and are currently studied by several research groups. The use of submicron silicon strip waveguides allows realizing extremely compact photonic circuits, using standard CMOS-processing methods. Therefore, they are a promising candidate for fabricating future photonic ICs using a cost-effective and high-yield process. We review the state-of-the-art of submicron silicon strip waveguides, starting from its basic properties including the single mode condition, scattering losses, bend losses, and polarization behavior. Subsequently we review the fabrication methods employed for realizing these circuits and discuss the compatibility with advanced CMOS-fabrication methods. Then basic waveguide structures such as splitters and fiber couplers are studied. Finally some examples of more complex devices, including cascaded Mach-Zehnder interferometers and arrayed waveguide gratings are shown.
Van Thourhout, D., Bogaerts, W., & Dunon, P. (2006). Submicron silicon strip waveguides. Springer Series in Optical Sciences, 119. https://doi.org/10.1007/978-3-540-28912-8_8