In this work, the Resistive switching (RS) phenomenon is experimentally investigated in N-type FDSOI Ω-gate NW-FETs with high-k dielectric. The location along the channel of the conductive filament through the device dielectric during switching is analyzed. Finally, the effects of RS on the characteristic transistor curves are also presented.
CITATION STYLE
Valdivieso, C., Rodriguez, R., Crespo-Yepes, A., Martin-Martinez, J., & Nafria, M. (2023). Resistive switching like-behavior in FD-SOI Ω-gate transistors. Solid-State Electronics, 209. https://doi.org/10.1016/j.sse.2023.108759
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