Two-dimensional polymer as a mask for surface nanopatterning

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Abstract

NaCl islands are used as a sacrificial layer to selectively deposit a boronic acid based two-dimensional polymer. The nanostructured polymer layer can be used as a negative mask to create Fe islands in a nanolithography mimicking process. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

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Clair, S., Ourdjini, O., Abel, M., & Porte, L. (2012). Two-dimensional polymer as a mask for surface nanopatterning. Advanced Materials, 24(9), 1252–1254. https://doi.org/10.1002/adma.201200063

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