A model of DC reactive magnetron sputtering for graded solar thermal absorbers

Abstract

In this work we present process modelling of reactive in-line sputtering. Although modelling of reactive sputtering is often used, most models are based on assumptions which make them insufficient for use in this case. The presented model takes into account a realistic deposition rate profile and distribution of reactive gas pressure. The model has been applied to reactive sputter deposition of graded solar thermal absorbers. It has been shown that the presented model represents a simple alternative to complex Monte Carlo simulations while still representing all important features of the process.