Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System

Abstract

In this work, a home-made closed-field unbalanced magnetron system for plasma sputtering purposes was constructed and operated. The effect of magnetrons was introduced by comparing the obtained Paschen's curve in existence of one or two magnetrons with no magnetron condition. Characterization of Paschen's curve as well as discharge current with gas pressure at different inter-electrode distances was introduced. These characterization results were effectively used to optimize the preparation of metal oxide films by plasma sputtering technique.