Abstract
Advances in Pulsed Laser Deposition (PLD) equipment and process design for the epitaxy of ZnO thin films on a-, and c-oriented sapphire substrates are reported. The achieved improvement of device relevant ZnO layer properties is directly related to our equipment design and novel process schemes. First results on growth and reflectivity of ZnO-MgO based dielectric Bragg resonators for future ZnO-based light emitter devices are shown. © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
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Lorenz, M., Hochmuth, H., Schmidt-Grund, R., Kaidashev, E. M., & Grundmann, M. (2004). Advances of pulsed laser deposition of ZnO thin films. In Annalen der Physik (Leipzig) (Vol. 13, pp. 59–60). Wiley-VCH Verlag. https://doi.org/10.1002/andp.200310046
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