Study of optical float-zone grown gallium oxide Schottky barrier diode

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Abstract

β − Ga 2 O 3 based lateral Schottky barrier diodes are fabricated using Ni/Au as Schottky contact and Ti/Au as Ohmic contact. The Sn-doped β − Ga 2 O 3 sample is grown by the optical float-zone technique. The effect of trenches, which are used for mesa isolation, on breakdown voltage is investigated. The device shows near-ideal characteristics in terms of built-in potential. The parasitic series and shunt resistances are extracted, and their dependency on temperature is established. Modeling of temperature-dependent reverse leakage current is demonstrated using the thermionic emission model, Poole-Frenkel emission model, and Fowler-Nordheim tunneling mechanism. The procedure to extract relevant parameters is explained in terms of bias and temperature dependency. The combined model shows excellent agreement with experimental data over a wide range of bias and temperature. The maximum electric field of 2.3 MV cm−1 is achieved.

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Sahoo, J., Vijayakumar, P., Saquib, T., Suganya, M., Ganesamoorthy, S., Muralidharan, R., & Nath, D. N. (2024). Study of optical float-zone grown gallium oxide Schottky barrier diode. Semiconductor Science and Technology, 39(5). https://doi.org/10.1088/1361-6641/ad3d03

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