Gas nozzle effect on the deposition of polysilicon by monosilane siemens reactor

6Citations
Citations of this article
5Readers
Mendeley users who have this article in their library.

This article is free to access.

Abstract

Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1mm/h, and the lowest energy consumption was 72kWhkg-1 in this study. © 2012 Seung Oh Kang et al.

Cite

CITATION STYLE

APA

Kang, S. O., Lee, U. J., Kim, S. H., You, H. J., Park, K., Park, S. E., & Park, J. H. (2012). Gas nozzle effect on the deposition of polysilicon by monosilane siemens reactor. International Journal of Photoenergy, 2012. https://doi.org/10.1155/2012/697653

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free