Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1mm/h, and the lowest energy consumption was 72kWhkg-1 in this study. © 2012 Seung Oh Kang et al.
CITATION STYLE
Kang, S. O., Lee, U. J., Kim, S. H., You, H. J., Park, K., Park, S. E., & Park, J. H. (2012). Gas nozzle effect on the deposition of polysilicon by monosilane siemens reactor. International Journal of Photoenergy, 2012. https://doi.org/10.1155/2012/697653
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