One-step direct-patterning template utilizing self-assembly of POSS-containing block copolymers

Abstract

(Figure Presented) We report the self-assembly of organic-inorganic block copolymers (BCP) in thin-films by simple solvent annealing on unmodified substrates. The resulting vertically oriented lamellae and cylinders are converted to a hard silica mask by a single step highly selective oxygen plasma etching. The size of the resulting nanostructures in the case of cylinders is less than 10 nm. © 2009 Wiley-VCH Verlag GmbH & Co. KGaA.