Direct etching of polymeric materials using a XeCl laser

J. E. Andrew; P. E. Dyer; D. Forster; P. H. Key

Journal ArticleOPEN ACCESS

Direct etching of polymeric materials using a XeCl laser

Andrew J
Dyer P
Forster D
et al.

Applied Physics Letters (1983) 43(8) 717-719

DOI: 10.1063/1.94488

383Citations

50Readers

Abstract

The direct etching of polyethylene terephthalate film using a XeCl laser has been investigated and is shown to be consistent with a thermal model for degradation. Microstructure revealed by deep etching suggests the UV laser may prove useful for studying polymeric materials. Polyimide and photoresist film has also been directly etched.

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Andrew, J. E., Dyer, P. E., Forster, D., & Key, P. H. (1983). Direct etching of polymeric materials using a XeCl laser. Applied Physics Letters, 43(8), 717–719. https://doi.org/10.1063/1.94488

Direct etching of polymeric materials using a XeCl laser

Abstract

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