Copper CMP is a corrosion-wear process, in which mechanical and chemical-electrochemical phenomena interact synergistically. Existing models generally treat copper CMP as a corrosion enhanced wear process. However, the underlying mechanisms suggest that copper CMP would be better modeled as a wear enhanced corrosion process, where intermittent asperity/abrasive action enhances the local...
CITATION STYLE
Choi, S., Doyle, F. M., & Dornfeld, D. A. (2017). Editors’ Choice—Efficiency of a CMP Pad at Removing Protective Material from Copper during CMP. ECS Journal of Solid State Science and Technology, 6(4), P187–P196. https://doi.org/10.1149/2.0351704jss
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