Infrared reflection absorption study of water interaction with H-terminated Si(100) surfaces

Abstract

Water adsorption on clean and hydrogenated Si(100) surfaces was studied under ultra high vacuum conditions using surface infrared spectroscopy. The study shows that H-Si-Si-OH and SiH2 species are formed on Si(100)-(2 × 1) and Si(100)-(2 × 1)-H surfaces, respectively. The reactivity behaviour of Si(100)-(3 × 1)-H and Si(100)-(1 × 1)-H is similar, both stabilizing oxygen inserted silicon dihydrides.