Potential on a copper reference electrode was measured at 100°C in each dehydrated melt of a KF·2HF, a NH4F·KF·4HF, and a NH4F·2HF against hydrogen evolution potential on a Pt rod by voltammetry with a sweep rate of 5 to 10 mV/s. Its value on a fresh copper reference electrode was unstable for first 30 days, whereas those on the anodically oxidized and the thermally fluorinated copper reference electrodes became stable for the shorter time. The stable value of potential on the thermally fluorinated copper reference electrode in a KF·2HF melt was 0.402 ± 0.003 V vs. H2. On the other hand, the theoretical value of potential calculated from thermodynamic data was 0.388 V. It has a little difference from observed value of it, and it may be caused by coexistence of CuF with CuF2 on the surface of a copper reference electrode. Although the theoretical potential on a Ni/NiF2 reference electrode was -0.248 V, the observed potential on a nickel reference electrode in a KF·2HF melt at 100°C was 0.096 ± 0.010 V vs. H2. It was different from the calculated potential of a Ni/NiF2 electrode. From these results, it is concluded that a new type of a copper electrode designated as Cu/CuF2-x (0
CITATION STYLE
Mimoto, A., Miyazaki, T., Takao, K., Yamashita, J., Nagamine, S., Inaba, M., & Tasaka, A. (2006). Measurement and thermodynamic analysis of reference electrode potentials in a few fluoride melts containing HF. In Proceedings - Electrochemical Society (Vol. PV 2004-24, pp. 448–457). https://doi.org/10.1149/200424.0448pv
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