Hot Filament Chemical Vapor Deposition: Enabling the Scalable Synthesis of Bilayer Graphene and Other Carbon Materials

Abstract

The hot filament chemical vapor deposition (HFCVD) technique is limited only by the size of the reactor and lends itself to be incorporated into continuous roll-to-roll industrial fabrication processes. We discuss the HFCVD reactor design and the interplay between the reactor parameters, such as filament and substrate temperatures, filamentto- substrate distance, and total pressure. Special attention is given to the large-area synthesis of bilayer graphene on copper, which is successfully grown by HFCVD with transmittance greater than 90% in the visible region and no gaps. We also discuss the HFCVD synthesis of carbon nanotubes, microcrystalline diamond, and nanocrystalline diamond.