Ge-Sb-Te chalcogenide thin films deposited by nanosecond, picosecond, and femtosecond laser ablation

23Citations
Citations of this article
30Readers
Mendeley users who have this article in their library.

Abstract

Ge-Sb-Te thin films were obtained by ns-, ps-, and fs-pulsed laser deposition (PLD) in various experimental conditions. The thickness of the samples was influenced by the Nd-YAG laser wavelength, fluence, target-to-substrate distance, and deposition time. The topography and chemical analysis results showed that the films deposited by ns-PLD revealed droplets on the surface together with a decreased Te concentration and Sb over-stoichiometry. Thin films with improved surface roughness and chemical compositions close to nominal values were deposited by ps- and fs-PLD. The X-ray diffraction and Raman spectroscopy results showed that the samples obtained with ns pulses were partially crystallized while the lower fluences used in ps- and fs-PLD led to amorphous depositions. The optical parameters of the ns-PLD samples were correlated to their structural properties.

Cite

CITATION STYLE

APA

Bulai, G., Pompilian, O., Gurlui, S., Nemec, P., Nazabal, V., Cimpoesu, N., … Focsa, C. (2019). Ge-Sb-Te chalcogenide thin films deposited by nanosecond, picosecond, and femtosecond laser ablation. Nanomaterials, 9(5). https://doi.org/10.3390/nano9050676

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free