Epitaxial growth of Nax CoO2 thin films by pulsed-laser deposition

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Abstract

Single-phase thin films of Nax Co O2 have been grown epitaxially by pulsed-laser deposition technique. The growth conditions were studied based on the log p O2 -1T phase diagram of Co- O2 using different types of substrate materials. For Na0.58 Co O2, metallic behavior is found down to 4.2 K. © 2005 American Institute of Physics.

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Krockenberger, Y., Fritsch, I., Cristiani, G., Matveev, A., Alff, L., Habermeier, H. U., & Keimer, B. (2005). Epitaxial growth of Nax CoO2 thin films by pulsed-laser deposition. Applied Physics Letters, 86(19), 1–3. https://doi.org/10.1063/1.1927272

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