Direct self-assembly of hierarchically grown rhodium thin films for electrocatalytic hydrogen evolution reaction

Abstract

Thin films of metallic rhodium (Rh) are developed on two different supports, nickel foam (NF) and titanium foil (Ti), and evaluated for electrochemical hydrogen evolution reaction (HER). The electrodes are prepared by aerosol-assisted chemical vapor deposition technique using a Rh diethyldithiocarabamte precursor for three distinct time periods of 40, 80, and 120 min at 500◦ C. The film consists of phase pure metallic Rh with hierarchical flower-like morphology. The structural features of such nanostructures can be modulated by adjusting the growth time. The HER catalytic performance data for the optimized films (i.e., with the deposition time of 80 min) suggest that the Rh deposited on Ti foil (Rh/Ti) catalyze the reaction substantially faster than Rh deposited on Ni foam (Rh/NF). To produce current density of 100 mA cm−2, the Rh/NF needed over potential of 263 mV, while the Rh/Ti electrode required only 175 mV. In spite of lower electrical conductivity, caused by the bare Ti foil, the Rh/Ti electrode exhibits superior HER performance. The Tafel slopes of Rh/NF and Rh/Ti electrodes are determined to be 52 and 42 mV dec−1, while the turnover frequencies are estimated to be 1.1 and 37.3 s−1 at over potential of 260 mV.