We set out to study the use of a series of ruthenocenes as possible and promising sources for ruthenium and/or ruthenium oxide film formation.The thermal stability of a series of ruthenocenes, including (η5-C5H4R)(η5-C5H4R')Ru (1), R = R' = H (3), R = H, R' = CH2NMe2 (5), R = H, R'= C(O)Me (6), R = R' = C(O)Me (7), R = H, R' = C(O)(CH2)3CO2H (8), R = H, R' = C(O)(CH2)2CO2H (9), R = H, R' = C(O)(CH2)3CO2Me (10), R = H, R'= C(O)(CH2)2CO2Me (11), R = R' = SiMe3), (η5-C4H3O-2,4-Me2)2Ru (2), and (η5-C5H5-2,4-Me2)2Ru (4) was studied by thermogravimetry. From these studies, it could be concluded that 1-4, 6 and 9-11 are the most thermally stable molecules. The sublimation pressure of these sandwich compounds was measured using a Knudsen cell. Among these, the compound 11 shows the highest vapor pressure. © 2010 by the authors.
Siddiqi, M. A., Siddiqui, R. A., Atakan, B., Roth, N., & Lang, H. (2010). Thermal stability and sublimation pressures of some ruthenocene compounds. Materials, 3(2), 1172–1185. https://doi.org/10.3390/ma3021172