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Al2O3 surface passivation characterized on hydrophobic and hydrophilic c-Si by a combination of QSSPC, CV, XPS and FTIR

Energy Procedia (2012) 27 355-360
DOI: 10.1016/j.egypro.2012.07.076
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Abstract

In this work, the influence of the c-Si surface finishing (hydrophobic/hydrophilic) prior to the deposition of the Al2O 3 passivation layer on the passivation quality is investigated. The samples are characterized by a combination of Quasi- Steady-State- PhotoConductance (QSSPC) Capacity-Conductance (CV), X-ray Photoelectron Spectroscopy (XPS) and Fourier Transformed InfraRed (FTIR) measurements. Furthermore, FTIR measurements are used to determine the thickness of interfacial SiOx layer.

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Goverde, H., Vermang, B., Morato, A., John, J., Horzel, J., Meneghesso, G., & Poortmans, J. (2012). Al2O3 surface passivation characterized on hydrophobic and hydrophilic c-Si by a combination of QSSPC, CV, XPS and FTIR. In Energy Procedia (Vol. 27, pp. 355–360). Elsevier Ltd. https://doi.org/10.1016/j.egypro.2012.07.076

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