In this work, the influence of the c-Si surface finishing (hydrophobic/hydrophilic) prior to the deposition of the Al2O 3 passivation layer on the passivation quality is investigated. The samples are characterized by a combination of Quasi- Steady-State- PhotoConductance (QSSPC) Capacity-Conductance (CV), X-ray Photoelectron Spectroscopy (XPS) and Fourier Transformed InfraRed (FTIR) measurements. Furthermore, FTIR measurements are used to determine the thickness of interfacial SiOx layer.
Goverde, H., Vermang, B., Morato, A., John, J., Horzel, J., Meneghesso, G., & Poortmans, J. (2012). Al2O3 surface passivation characterized on hydrophobic and hydrophilic c-Si by a combination of QSSPC, CV, XPS and FTIR. In Energy Procedia (Vol. 27, pp. 355–360). Elsevier Ltd. https://doi.org/10.1016/j.egypro.2012.07.076