Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis

9Citations
Citations of this article
25Readers
Mendeley users who have this article in their library.
Get full text

Abstract

The temporal evolution of photogenerated carriers in CuWO4, CuO and WO3 thin films deposited via a direct chemical vapor deposition approach was studied using time-resolved microwave conductivity and terahertz spectroscopy to obtain the photocarrier lifetime, mobility and diffusion length. The carrier transport properties of the films prepared by varying the copper-to-tungsten stoichiometry were compared and the results related to the performance of the compositions built into respective photoelectrochemical cells. Superior carrier mobility was observed for CuWO4 under frontside illumination.

Cite

CITATION STYLE

APA

Hirst, J., Müller, S., Peeters, D., Sadlo, A., Mai, L., Reyes, O. M., … Eichberger, R. (2019). Comparative Study of Photocarrier Dynamics in CVD-deposited CuWO4, CuO, and WO3 Thin Films for Photoelectrocatalysis. Zeitschrift Fur Physikalische Chemie, 699–717. https://doi.org/10.1515/zpch-2019-1485

Register to see more suggestions

Mendeley helps you to discover research relevant for your work.

Already have an account?

Save time finding and organizing research with Mendeley

Sign up for free