Morphology control of Zn-SiO2 composite films electrodeposited from aqueous solution containing quaternary ammonium cations

Abstract

Zn-SiO2 alloys were electrodeposited from acidic aqueous solution containing cationic surfactants such as diallyl-dimethyl-ammonium chloride, trimethyl-tetradecyl-ammonium chloride, trimethyl-stearyl-ammonium chloride and dimethyl-distearyl-ammonium chloride. Zn-SiO2 alloy thin films were obtained at the wide current density range from 5 A/dm2 to 100 A/dm2. SiO2 content in deposits was ca. 10 % at the maximum using the solution containing a surfactant with molecular weight range of 200 to 300.