Homebrew Photolithography for the Rapid and Low-Cost, “Do It Yourself” Prototyping of Microfluidic Devices

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Abstract

Photolithography is the foundational process at the root of micro-electromechanical (MEMS) and microfluidic systems manufacture. The process is descendant from the semiconductor industry, originating from printed circuit board and microprocessor fabrication, itself historically performed in a cleanroom environment utilizing expensive, specialist microfabrication equipment. Consequently, these conditions prove cost-prohibitive and pose a large barrier to entry. We present a novel homebrew, “do-it-yourself” method for performing photolithography to produce master mold wafers using only household appliances and homemade equipment at the bench side, outside of a cleanroom, producing a range of designs including spiral, serpentine, rectangular, and circulatory. Our homebrew processes result in the production of microfluidic channels with feature resolution of ∼85 μm width and 50 μm height utilizing inkjet-printed photomasks on transparency film to expose dry-film photoresist. From start to finish, the entire process takes under <90 min and costs

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Todd, D., & Krasnogor, N. (2023). Homebrew Photolithography for the Rapid and Low-Cost, “Do It Yourself” Prototyping of Microfluidic Devices. ACS Omega, 8(38), 35393–35409. https://doi.org/10.1021/acsomega.3c05544

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