Abstract
Electro-absorption from GeSi heterostructures is receiving growing attention as a high performance optical modulator for short distance optical interconnects. Ge incorporation with Si allows strong modulation mechanism using the Franz-Keldysh effect and the quantum-confined Stark effect from bulk and quantum well structures at telecommunication wavelengths. In this review, we discuss the current state of knowledge and the on-going challenges concerning the development of high performance GeSi electro-absorption modulators. We also provide feasible future prospects concerning this research topic. © 2014 National Institute for Materials Science.
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Chaisakul, P., Marris-Morini, D., Rouifed, M. S., Frigerio, J., Chrastina, D., Coudevylle, J. R., … Vivien, L. (2014). Recent progress in GeSi electro-absorption modulators. Science and Technology of Advanced Materials. Institute of Physics Publishing. https://doi.org/10.1088/1468-6996/15/1/014601
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