Capacitance voltage measurements on n-type InAs MOS diodes

Abstract

The electrical properties of the interface between pyrolytically deposited SiO2 and InAs have been investigated by measuring the admittance of Al-SiO2-InAs MOS diodes at room temperature and 77°K. The room temperature measurements yield a rather high surface state density of 2·5 × 1012 states/eV/cm2. The surface state density undergoes an anomalous decrease to 2·8 × 1011 states/eV/cm2 at 77°K. A charge which is linearly dependent on the voltage across the oxide is trapped in the oxide. Conduction through the oxide causes the diodes to enter a deep depletion condition at 77°K. © 1971.