Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

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Abstract

The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics was investigated and a combined mode of voltage and current was observed at a pressure as low as 0.007 Pa. Carbon nitride thin films were synthesized using this method. Characterization of the films showed that the deposition rate was high, and the films were composed of a single amorphous carbon nitride phase with N/C ratio close to that of C3N4, with the bonding mainly of C-N type. © 2001 Elsevier Science B.V.

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Xu, J., Deng, X., Zhang, J., Lu, W., & Ma, T. (2001). Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering. Thin Solid Films, 390(1–2), 107–112. https://doi.org/10.1016/S0040-6090(01)00926-9

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