Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films

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Abstract

© 2018 Katsube et al. We have designed and developed a combined system of pulsed laser deposition (PLD) and non-contact atomic force microscopy (NC-AFM) for observations of insulator metal oxide surfaces. With this system, the long-period iterations of sputtering and annealing used in conventional methods for preparing a metal oxide film surface are not required. The performance of the combined system is demonstrated for the preparation and high-resolution NC-AFM imaging of atomically flat thin films of anatase TiO 2 (001) and LaAlO 3 (100).

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Katsube, D., Yamashita, H., Abo, S., & Abe, M. (2018). Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films. Beilstein Journal of Nanotechnology, 9(1), 686–692. https://doi.org/10.3762/bjnano.9.63

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